By Vivek Bakshi

Severe ultraviolet lithography (EUVL) is the crucial lithography know-how aiming to fabricate laptop chips past the present 193-nm-based optical lithography, and up to date development has been made on numerous fronts: EUV gentle assets, optics, optics metrology, infection keep an eye on, mask and masks dealing with, and resists.

This complete quantity is created from contributions from the world's top EUVL researchers and gives the entire severe info wanted by way of practitioners and people short of an advent to the field.

Contents include:

* The background of EUV Lithography * EUV resource expertise (requirements, know-how descriptions, and standing) * EUV optics (projection process layout, multilayer coatings, and substrates) * numerous EUV wavefront dimension ideas for optical checking out *Contamination and its keep watch over in EUVL scanners (optics and collector optics infection) * EUV masks and masks metrology (substrates, clean fabrication, absorber stacks and bottom conductive coatings, patterning, cleansing, and part shift mask) * the basics and improvement of EUV withstand expertise, together with LER * The layout and parts of the 1st METs, that have enabled face up to improvement * the basic layout concerns for an EUVL scanner and outlines of a full-field scanner's a variety of parts * EUVL procedure patterning functionality * Lithography fee of ownership.

curiosity in EUVL expertise keeps to extend, and this quantity offers the root required for knowing and employing this interesting technology.

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